Test Method for
Quantifying Tungsten Silicide Semiconductor Process Films
for Composition and Thickness1
This standard is issued under the fixed designation F 1894; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
click below Astm F 1894 – 98 (Reapproved 2003) pdf free download